Platform for the Accelerated Realization, Analysis, and Discovery of Interface Materials
Thin Film Growth Facility (at Cornell University)
The PARADIM Thin Film Growth Facility at Cornell provides unprecedented capability for the growth and characterization of thin films and interfaces of inorganic materials.
The signature tool will be an integrated instrument consisting of an oxide MBE system, an ARPES system, and an MOCVD system.
The MBE system has eleven sources that can be used simultaneously and changed/refilled without breaking growth chamber vacuum, 62 different elements are available. This gives PARADIM users unprecedented flexibility in exploring new materials by design. The MBE system is currently available for users.
The ARPES system is based on prior designs and is being custom built utilizing major components from Scienta Omicron.
The integrated MOCVD system design and purchase is still pending and will be completed once the ARPES and MBE are installed, coupled together, and available to users.
PARADIM offers two additional MOCVD systems for the growth of “standard” transition metal dichalcogenide films. The two MOCVDs have been built and installed in a fully renovated PARADIM laboratory designed for this purpose. They are being used by PARADIM staff and interns to grow samples for distribution to users, based on proven recipes for depositing single-monolayer thick films of MoS2, MoSe2, WS2, and WSe2 homogeneously over 4” diameter substrates.
The new Cornell PARADIM Thin Film Facility is housed in over 1400 sq. ft. of newly renovated space in Duffield Hall.